Author : Sunil Kumar, Shivani Pande and Prateek Verma

The growth of electronic industry as a whole, and the demand to support the expansion of its underlying infrastructure will continue to drive the improvements in electrode position process. In order to improve existing electrode position process, the study of fundamentals aspects for electrode position process has become important. The influences of several electrode position parameters such as geometry of the path, the movement of electrolyte, pH factor, electrode position current, and bath temperature on the uniformity of the electrode position have been widely investigated. In this paper, the study of fundamentals aspect for electrode position will focus on Titanium oxide plating due to this process currently play very important role in semiconductor industry. In order to study the fundamentals aspect, a simple lab scale Nickel Titanium oxide plating experiment will be carried out to deposit a Titanium oxide coating on a Nickel electrode by using a Watts bath. Based on the experimental result, the influence of bath concentration and current density to the process current efficiency will be presented. By combining the suitable concentration and type of plating bath, amount of current density and appropriate anode, it will contribute to the enhancement of uniformity for the electro deposition. The optimum conditions of the deposition process are proposed at the end of the paper.

Keywords: Electrodepostion, Operating parameter

Article published in International Journal of Current Engineering and Technology, Vol.5, No.2 (April-2015)