Author : Hussein Kh. Rsheed, Amal K. Jassim and Ammar S. Hameed

Ge weight doping percentage by 1% antimony (Ge:Sb) films have been deposited by thermal evaporation technique on glass substrate at room temperature under vacuum of 10-5 mbar with rate of deposition near to 10Å/sec. These films of different thickness (0.25, 0.5, 0.75, 1.0) μm have been annealed at different temperatures Ta (373, 473)K, to study the effect of thickness and annealing temperature on the electrical properties. These properties include the (DC, AC) conductivity from which the transport mechanism of the charge carriers can be estimated, and also the Hall Effect which gives information about the type, density and mobility of carriers.

Keywords: Thin film, electrical properties, Hall mobility, annealing temperature, Ge:Sb thin films

Article published in International Journal of Current Engineering and Technology, Vol.5, No.3 (June-2015)